Role of ions in ion-based film formation

Abstract In ion-based film formation, the properties of a film are controlled by changing the deposition conditions such as the acceleration voltage and the content of ions. The role of ions in film formation is discussed under three headings: the effect of inert gas ion bombardment after or during film formation, the effect of the kinetic energy of source material ions, and the effect of the charges of the ions. A comparative description of various experiments according to the above categories is given. In the case of inert gas ion bombardment after or during film formation, ions of a few hundred electronvolts to a few kiloelectronvolts were used. In depositions where the source material is ionized, the effective incident energy of the ions is found to be of the order of a few electronvolts to several hundred electronvolts which is much lower than that in inert gas bombardment. Various kinds of film formation technique are reviewed from the viewpoints of kinetic energy and charge content. Although these parameters may vary according to the film formation technique, it was found that their role in influencing film properties does not change.

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