Reliability analysis of the low resistance state stability of Ge0.3Se0.7 based solid electrolyte nonvolatile memory cells
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Rainer Waser | Hermann Kohlstedt | Carsten Kügeler | Paul Meuffels | R. Waser | C. Kügeler | R. Soni | P. Meuffels | H. Kohlstedt | R. Soni
[1] Fausto Fantini,et al. Electromigration testing of integrated circuit interconnections , 1998 .
[2] M. Kozicki,et al. Nanoscale memory elements based on solid-state electrolytes , 2005, IEEE Transactions on Nanotechnology.
[3] Garland,et al. Measurement of the fourth moment of the current distribution in two-dimensional random resistor networks. , 1989, Physical review. B, Condensed matter.
[4] Sorbello. Electromigration and the local transport field in mesoscopic systems. , 1989, Physical review. B, Condensed matter.
[5] S. Yasuda,et al. Nonpolar resistance switching of metal/binary-transition-metal oxides/metal sandwiches: Homogeneous/inhomogeneous transition of current distribution , 2007, cond-mat/0702564.
[6] Takayasu. Simulation of electric breakdown and resulting variant of percolation fractals. , 1985, Physical review letters.
[7] R. Waser,et al. Nanoionics-based resistive switching memories. , 2007, Nature materials.
[8] K. Terabe,et al. Quantized conductance atomic switch , 2005, Nature.
[9] Richard S. Potember,et al. Electrical switching and memory phenomena in Cu‐TCNQ thin films , 1979 .
[10] Tamás Vicsek,et al. Fractal models for diffusion controlled aggregation , 1983 .
[11] Rainer Waser,et al. Impedance spectroscopy of TiO2 thin films showing resistive switching , 2006 .
[12] S. Kirkpatrick. Percolation and Conduction , 1973 .
[13] J. Stathis. Percolation models for gate oxide breakdown , 1999 .
[14] R. Waser,et al. Resistive Switching in Ge0.3Se0.7 Films by Means of Copper Ion Migration , 2007 .
[15] Statistical model for prebreakdown current jumps and breakdown caused by single traps in magnetic tunnel junctions , 2003 .
[16] H. Kuwahara,et al. Current switching of resistive states in magnetoresistive manganites , 1997, Nature.
[17] Byung Joon Choi,et al. Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition , 2005 .
[18] T Nogami,et al. The electromigration lifetime determined from the minimum time to failure in an acceleration test , 1995 .