Optimised Antireflection Coatings using Silicon Nitride on Textured Silicon Surfaces based on Measurements and Multidimensional Modelling

[1]  R. M. Swanson,et al.  Measurement of the emitter saturation current by a contactless photoconductivity decay method , 1985 .

[2]  Armin G. Aberle,et al.  Optimised antireflection coatings for planar silicon solar cells using remote PECVD silicon nitride and porous silicon dioxide , 1999 .

[3]  Erik Stensrud Marstein,et al.  Plasma-enhanced chemical vapour-deposited silicon nitride films; The effect of annealing on optical properties and etch rates , 2008 .

[4]  Arthur Weeber,et al.  Bulk and surface passivation of silicon solar cells accomplished by silicon nitride deposited on industrial scale by microwave PECVD , 2005 .

[5]  R. Sinton,et al.  Contactless determination of current–voltage characteristics and minority‐carrier lifetimes in semiconductors from quasi‐steady‐state photoconductance data , 1996 .

[6]  A. Leo,et al.  Characterisation of industrial-scale remote PECVD SiN depositions , 2003, 3rd World Conference onPhotovoltaic Energy Conversion, 2003. Proceedings of.

[7]  A. Aberle,et al.  High-quality surface passivation of low-resistivity p-type C-Si by hydrogenated amorphous silicon nitride deposited by industrial-scale microwave PECVD , 2011, 2011 37th IEEE Photovoltaic Specialists Conference.

[8]  Amorphous hydrogenated silicon-nitride films for applications in solar cells , 2008 .

[9]  G. Jellison,et al.  Characterization and optimization of absorbing plasma-enhanced chemical vapor deposited antireflection coatings for silicon photovoltaics. , 1997, Applied optics.

[10]  G. Jellison,et al.  Parameterization of the optical functions of amorphous materials in the interband region , 1996 .

[11]  B. Hoex.  Functional thin films for high-efficiency solar cells , 2008 .

[12]  W. Kern.  The Evolution of Silicon Wafer Cleaning Technology , 1990 .