Laser Chemical Vapor Deposition Using Cw And Pulsed Lasers

Laser chemical vapor deposition (LCVD) uses a focused laser beam to locally heat the substrate and drive the CVD reaction. LCVD, therefore, shares the advantages of other laser processing techniques including spatial resolution and control and rapid heating and cooling rates. Characteristics of several types of LCVD films and experiments in optical monitoring of LCVD rates using both pulsed and cw laser are presented.