论文信息 - Fine thickness control of amorphous silicon by wet-etching for low loss wire waveguide

Fine thickness control of amorphous silicon by wet-etching for low loss wire waveguide

Isotropic wet-etching without surface roughening was applied to an a-Si:H film with nanometer-scale thickness controllability. Record ∼1.2 dB/cm low propagation loss was obtained in an etched wire waveguide, being comparable to those of SOI waveguides.

[1] Shiyang Zhu,et al. Low-loss amorphous silicon wire waveguide for integrated photonics: effect of fabrication process and the thermal stability. , 2010, Optics express.

[2] H. Kawashima,et al. Ultrafast nonlinear effects in hydrogenated amorphous silicon wire waveguide. , 2010, Optics express.

[3] E. Sleeckx,et al. Low-loss amorphous silicon-on-insulator technology for photonic integrated circuitry , 2009 .

[4] Jurgen Michel,et al. Impedance matching vertical optical waveguide couplers for dense high index contrast circuits. , 2008, Optics express.