论文信息 - Mechanism of nickel disilicide growth caused by RIE plasma-induced damage on silicon substrate - 字舞流文

Mechanism of nickel disilicide growth caused by RIE plasma-induced damage on silicon substrate

K. Asai | S. Sakamori | T. Okudaira | K. Maekawa | M. Kojima | K. Kashihara | T. Yamaguchi | T. Tsutsumi | J. Matsumoto | T. Yokoi | K. Kihara