Multi-trigger resist patterning with ASML NXE3300 EUV scanner
暂无分享,去创建一个
Geert Vandenberghe | Danilo De Simone | John Roth | Guy Dawson | Alexandra McClelland | Yannick Vesters | Alex P. G. Robinson | Carmen Popescu | Wolfgang Theis
[1] C. Popescu,et al. High-resolution EUV lithography using a multi-trigger resist , 2018, Advanced Lithography.
[2] Patrick P. Naulleau,et al. Directly patterned inorganic hardmask for EUV lithography , 2011, Advanced Lithography.
[3] Warren Montgomery,et al. Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography , 2011, Advanced Lithography.
[4] Patrick P. Naulleau. EUV lithography patterning challenges , 2016 .
[5] Andreas Frommhold,et al. Sensitivity enhancement of the high-resolution xMT multi-trigger resist for EUV lithography , 2017, Advanced Lithography.
[6] Geert Vandenberghe,et al. EUV photoresist patterning characterization for imec N7/N5 technology , 2018, Advanced Lithography.
[7] Yasin Ekinci,et al. EUV resists based on tin-oxo clusters , 2014, Advanced Lithography.