Thin metallic oxides as transparent conductors
暂无分享,去创建一个
[1] J. P. Marton,et al. Physical Properties of SnO2 Materials I . Preparation and Defect Structure , 1976 .
[2] F. Shinoki,et al. Optical properties of r.f. reactive sputtered tin-doped In2O3 films , 1979 .
[3] K. Miyake,et al. Transparent Conducting Cadmium‐Tin Oxide Films Deposited by RF Sputtering from a CdO ‐ SnO2 Target , 1980 .
[4] M. Mizuhashi. Electrical properties of post-oxidized In2O3:Sn films , 1981 .
[5] Osama Tabata,et al. A new CVD technique for the preparation of transparent conducting films , 1979 .
[6] A. Ghosh,et al. Spray‐deposited high‐efficiency SnO2/n‐Si solar cells , 1979 .
[7] E. Kauer,et al. Transparent heat-reflecting coatings based on highly doped semiconductors☆ , 1981 .
[8] B. Seraphin. Spectrally selective surfaces and their impact on photothermal solar energy conversion , 1979 .
[9] John B. Goodenough,et al. X-ray photoemission spectroscopy studies of Sn-doped indium-oxide films , 1977 .
[10] J. Manifacier,et al. In2O3 : (Sn) and SnO2 : (F) films - application to solar energy conversion part II — Electrical and optical properties , 1979 .
[11] D. B. Fraser,et al. Highly Conductive, Transparent Films of Sputtered In2 − x Sn x O 3 − y , 1972 .
[12] Glass surface coatings resistant to mechanical damage , 1981 .
[13] J. C. Fan,et al. Preparation of Sn‐doped In2O3 (ITO) films at low deposition temperatures by ion‐beam sputtering , 1979 .
[14] H. Müller. Electrical and Optical Properties of Sputtered In2O3 films. I. Electrical Properties and Intrinsic Absorption , 1968 .
[15] Low emissivity coatings for the improvement of the insulation properties of double-glazing units☆ , 1981 .
[16] M. Mizuhashi. Electrical properties of vacuum-deposited indium oxide and indium tin oxide films , 1980 .
[17] A. Ghosh,et al. Structure, photovoltaic properties, and angle‐of‐incidence correlations of electron‐beam‐deposited SnO2/n‐Si solar cells , 1979 .
[18] G. K. Bhagavat,et al. X-ray and electron diffraction studies of chemically vapour-deposited tin oxide films , 1981 .
[19] C. Vincent. The Nature of Semiconductivity in Polycrystalline Tin Oxide , 1972 .
[20] James F. Smith,et al. Reactive magnetron deposition of transparent conductive films , 1980 .
[21] R. Ghoshtagore,et al. Mechanism of CVD Thin Film SnO2 Formation , 1978 .
[22] L. H. Slack,et al. Effects of Additions to SnO2 Thin Films , 1976 .
[23] S. Ashok,et al. Spray-deposited ITO—Silicon SIS heterojunction solar cells , 1980, IEEE Transactions on Electron Devices.
[24] W. Molzen. Characterization of transparent conductive thin films of indium oxide , 1975 .
[25] G. Haacke. Transparent electrode properties of cadmium stannate , 1976 .
[26] R. L. Longini,et al. A thermodynamic analysis of the deposition of SnO2 thin films from the vapor phase , 1979 .
[27] J. Manifacier,et al. Deposition of In2O3SnO2 layers on glass substrates using a spraying method , 1981 .
[28] Noboru Yamazoe,et al. Interactions of tin oxide surface with O2, H2O AND H2 , 1979 .
[29] J. Manifacier,et al. Efficient sprayed In2O3 : Sn n‐type silicon heterojunction solar cell , 1977 .
[30] C. Aita,et al. Postdeposition annealing behavior of rf sputtered ZnO films , 1980 .
[31] J. Maudes,et al. Sprayed SnO2 films: Growth mechanism and film structure characterization , 1980 .
[32] S. Ghandhi,et al. The Effect of Phosphorus Doping on Tin Oxide Films Made by the Oxidation of Phosphine and Tetramethyltin II . Electrical Properties , 1980 .
[33] G. Carver,et al. Chemical-vapor-deposited molybdenum films of high infrared reflectance , 1979 .
[34] Optical layers produced by sputtering , 1981 .
[35] J. Fan,et al. Transparent heat mirrors for solar-energy applications. , 1976, Applied optics.
[36] J. Spitz,et al. Chemical Vapor Deposition at Low Temperatures , 1975 .
[37] T. Ma,et al. High‐quality transparent conductive indium oxide films prepared by thermal evaporation , 1980 .
[38] George L. Clark. Applied X-Rays , 1955 .
[39] N. Jackson,et al. Experience in the control and evaluation of coatings on glass containers , 1981 .
[40] James Kane,et al. Chemical Vapor Deposition of Antimony‐Doped Tin Oxide Films Formed from Dibutyl Tin Diacetate , 1976 .
[41] H. Dislich,et al. Amorphous and crystalline dip coatings obtained from organometallic solutions: Procedures, chemical processes and products , 1981 .
[42] A. Dubois,et al. Étude par diffraction de rayons X de films à base d'oxydes d'étain et d'indium , 1973 .
[43] J. P. Fillard,et al. Optical and electrical properties of SnO2 thin films in relation to their stoichiometric deviation and their crystalline structure , 1977 .
[44] M. Furukoshi,et al. Properties of stannic oxide thin films produced from the SnCl4-H2O and SnCl4-H2O2 reaction systems , 1978 .
[45] J. Leblanc. THÈSE DE 3ÈME CYCLE , 1978 .
[46] J. Blocher. Coating of glass by chemical vapor deposition , 1981 .
[47] H. Waal,et al. Tin oxide coatings: Physical properties and applications , 1981 .
[48] L. Holland,et al. Vacuum deposition of thin films , 1956 .
[49] R. Howson,et al. Deposition of transparent heat-reflecting coatings of metal oxides using reactive planar magnetron sputtering of a metal and/or alloy☆ , 1981 .
[50] S. Kulaszewicz. Electrical, optical and structural properties of SnO2:Sb films deposited by hydrolysis , 1980 .
[51] H. Müller. Electrical and Optical Properties of Sputtered In2O3 films. II. Optical Properties in the Near Infrared , 1968 .
[52] G. Haacke,et al. Spray Deposition of Cadmium Stannate Films , 1977 .
[53] J. Bosnell,et al. On the structure of indium oxide-tin oxide transparent conducting films by electron diffraction and electron spectroscopy , 1973 .
[54] J. Sites,et al. Efficient photovoltaic heterojunctions of indium tin oxides on silicon , 1976 .
[55] R. Bunshah,et al. Preparation of In2O3 and tin-doped In2O3 films by a novel activated reactive evaporation technique , 1980 .
[56] Robert H. Rediker,et al. Electrical Properties of High‐Quality Stannic Oxide Crystals , 1971 .
[57] J. Manifacier,et al. In2O3:(Sn) and SnO2:(F) films — Application to solar energy conversion; part 1 — Preparation and characterization , 1979 .
[58] S. Ghandhi,et al. The Effect of Phosphorus Doping on Tin Oxide Films Made by the Oxidation of Phosphine and Tetramethyltin I . Growth and Etching Properties , 1980 .
[59] J. Spitz. Selective surfaces for high temperature solar photothermal conversion , 1977 .
[60] R. Groth. Untersuchungen an halbleitenden Indiumoxydschichten , 1966 .
[61] Z. Jarzȩbski. Physical Properties of SnO[sub 2] Materials , 1976 .
[62] N. Yamamoto,et al. The Effect of Reducing Gases on the Conductivities of Metal Oxide Semiconductors , 1981 .
[63] R. Pommier,et al. Sprayed films of indium tin oxide and fluorine-doped tin oxide of large surface area☆ , 1981 .
[64] T. Coutts. Active and passive thin film devices , 1978 .
[65] W. Kern,et al. Chemical Vapor Deposition of Transparent, Electrically Conductive Tin Oxide Films Formed from Dibutyl Tin Diacetate , 1975 .
[66] M. Buchanan,et al. Preparation of conducting and transparent thin films of tin‐doped indium oxide by magnetron sputtering , 1980 .