Ultra-deep subwavelength periodic patterning through multilayered metamaterial microcavity
暂无分享,去创建一个
Hai Ming | Junxue Chen | Xiangxian Wang | Ji-Gang Hu | Guanjun Wang | Yongqiang Yu | Chunyan Wu | Lin-Bao Luo | H. Ming | L. Luo | Junxue Chen | Chunyan Wu | Yongqiang Yu | Xiangxian Wang | Jigang Hu | Guanjun Wang
[1] Changtao Wang,et al. Breaking the feature sizes down to sub-22 nm by plasmonic interference lithography using dielectric-metal multilayer. , 2009, Optics express.
[2] Pei Wang,et al. Numerical simulation of nanolithography with the subwavelength metallic grating waveguide structure. , 2006, Optics express.
[3] Changtao Wang,et al. Localizing surface plasmons with a metal-cladding superlens for projecting deep-subwavelength patterns , 2009 .
[4] Roderick R. Kunz,et al. Review of technology for 157-nm lithography , 2001, IBM J. Res. Dev..
[5] Simin Feng,et al. Diffraction-suppressed high-resolution imaging through metallodielectric nanofilms. , 2006, Optics express.
[6] Alfred A. Mondelli,et al. A review of ion projection lithography , 1998 .
[7] W. Ge,et al. Tunable ultra-deep subwavelength photolithography using a surface plasmon resonant cavity. , 2011, Optics express.
[8] R. Blaikie,et al. Subwavelength optical imaging of evanescent fields using reflections from plasmonic slabs. , 2007, Optics express.
[9] Michael C. McAlpine,et al. Nanoimprint Lithography for Hybrid Plastic Electronics , 2003 .
[10] Changtao Wang,et al. Sub-diffraction-limited interference photolithography with metamaterials. , 2008, Optics express.
[11] D. Tsai,et al. Directed subwavelength imaging using a layered metal-dielectric system , 2006, physics/0608170.
[12] H. Raether. Surface Plasmons on Smooth and Rough Surfaces and on Gratings , 1988 .
[13] R. W. Christy,et al. Optical constants of transition metals: Ti, V, Cr, Mn, Fe, Co, Ni, and Pd , 1974 .
[14] Xu,et al. "Dip-Pen" nanolithography , 1999, Science.
[15] H. Schift. Nanoimprint lithography: An old story in modern times? A review , 2008 .
[16] Changtao Wang,et al. Deep subwavelength photolithography based on surface plasmon polariton resonance with metallic grating waveguide heterostructure , 2010 .
[17] N. Fang,et al. Sub-100 nm lithography using ultrashort wavelength of surface plasmons , 2004 .
[18] R. H. Stulen,et al. Extreme ultraviolet lithography , 1998 .
[19] Zhaowei Liu,et al. Projecting deep-subwavelength patterns from diffraction-limited masks using metal-dielectric multilayers , 2008 .
[20] Xiang Zhang,et al. Surface plasmon interference nanolithography. , 2005, Nano letters.
[21] Christophe Vieu,et al. Electron beam lithography: resolution limits and applications , 2000 .
[22] Xiangang Luo,et al. Subwavelength photolithography based on surface-plasmon polariton resonance. , 2004, Optics express.
[23] R. Blaikie,et al. Evanescent interferometric lithography. , 2001, Applied Optics.
[24] E. Palik. Handbook of Optical Constants of Solids , 1997 .
[25] Jerome P. Silverman,et al. Challenges and progress in x-ray lithography , 1998 .
[26] I. Malitson. Interspecimen Comparison of the Refractive Index of Fused Silica , 1965 .