Ultraviolet laser-induced damage growth characteristic and mechanism on the surface of fused silica

The growth of laser induced damage on the surface of fused silica plays a major role in determining the operation fluence and optics lifetime in high power laser system. In this paper, the damage growth characteristic of fused silica and possible growth mechanisms were investigated. The morphology of damage site was measured by scanning electron microscopy (SEM) and optical microscopy (OM). The finite difference time domain (FDTD) method was used to calculate the electric field distribution around the damage site. Furthermore, energy dispersive spectrometers (EDS) micro-analysis technique, x-ray photoelectron spectrometer (XPS) and Raman spectroscopy were applied to detect the chemical composition, point defect and microstructure of damage site in order to explore the growth mechanism. It’s found that the growth threshold is greatly affected by the size of damage site, and the growth threshold of damage site is much lower than that of undamaged area. Theoretical calculation demonstrated that the rough damage site can strong modulate the distribution of electric field and result in the enhancement of local light field around the damage site. Results also showed that the oxygen defect was generated and the structure was changed after initial laser damage. Based on the above analysis, a mechanism of laser-induced damage growth on fused silica surface was proposed.

[1]  Stavros G. Demos,et al.  Optical defects produced in fused silica during laser-induced breakdown , 2003 .

[2]  Stavros G Demos,et al.  Time-resolved imaging of processes associated with exit-surface damage growth in fused silica following exposure to nanosecond laser pulses. , 2013, Optics express.

[3]  Patricia Volto,et al.  Self-focusing and rear surface damage in a fused silica window at 1064 nm and 355 nm , 2003, SPIE Laser Damage.

[4]  David A. Cross,et al.  The effect of pulse duration on the growth rate of laser-induced damage sites at 351 nm on fused silica surfaces , 2009, Laser Damage.

[5]  M. Loiseau,et al.  Effects of wavelengths combination on initiation and growth of laser-induced surface damage in SiO2 , 2007, SPIE Laser Damage.

[6]  Stevens-Kalceff.  Electron-irradiation-induced radiolytic oxygen generation and microsegregation in silicon dioxide polymorphs , 2000, Physical review letters.

[7]  Michael D. Feit,et al.  Growth of laser damage in fused silica: diameter to depth ratio , 2007, SPIE Laser Damage.

[8]  Hideo Hosono,et al.  Experimental Evidence for Frenkel Defect Formation in Amorphous SiO 2 by Electronic Excitation , 1998 .

[9]  Michael D. Feit,et al.  Initiation, growth, and mitigation of UV-laser-induced damage in fused silica , 2002, SPIE Laser Damage.

[10]  David A Cross,et al.  Growth behavior of laser-induced damage on fused silica optics under UV, ns laser irradiation. , 2010, Optics express.

[11]  Michael D. Feit,et al.  Growth of laser damage in SiO2 under multiple wavelength irradiation , 2005, SPIE Laser Damage.

[12]  Michael D. Feit,et al.  Growth of laser damage on the input surface of SiO2 at 351 nm , 2006, SPIE Laser Damage.

[13]  Jianda Shao,et al.  Growth mechanism of laser-induced damage in fused silica , 2011, Laser Damage.

[14]  Michel A. Josse,et al.  Parametric study of the growth of damage sites on the rear surface of fused silica windows , 2003, SPIE Laser Damage.

[15]  M. Fox.  Optical Properties of Solids , 2010 .

[16]  Michael D. Feit,et al.  Growth of laser-initiated damage in fused silica at 351 nm , 2001, SPIE Laser Damage.