Characterization of the deep levels responsible for non-radiative recombination in InGaN/GaN light-emitting diodes

This paper presents an extensive investigation of the deep levels related to non-radiative recombination in InGaN/GaN light-emitting diodes (LEDs). The study is based on combined optical and deep-level transient spectroscopy measurements, carried out on LEDs with identical structure and with different values of the non-radiative recombination coefficient. Experimental data lead to the following, relevant, results: (i) LEDs with a high non-radiative recombination coefficient have a higher concentration of a trap (labeled as “e2”) with an activation energy of 0.7 eV, which is supposed to be located close to/within the active region; (ii) measurements carried out with varying filling pulse duration suggest that this deep level behaves as a point-defect/dislocation complex. The Arrhenius plot of this deep level is critically compared with the previous literature reports, to identify its physical origin.

[1]  B. Hahn,et al.  A combined electro-optical method for the determination of the recombination parameters in InGaN-based light-emitting diodes , 2009 .

[2]  M. Meneghini,et al.  Deep-Level Characterization in GaN HEMTs-Part I: Advantages and Limitations of Drain Current Transient Measurements , 2013, IEEE Transactions on Electron Devices.

[3]  Ferdinand Scholz,et al.  Wavelength‐dependent determination of the recombination rate coefficients in single‐quantum‐well GaInN/GaN light emitting diodes , 2013 .

[4]  E. Fred Schubert,et al.  Temperature‐dependent light‐output characteristics of GaInN light‐emitting diodes with different dislocation densities , 2010 .

[5]  Pierre Gibart,et al.  Field dependent transformation of electron traps in GaN p–n diodes grown by metal–organic chemical vapour deposition , 2004 .

[6]  Daniel D. Koleske,et al.  Dependence of radiative efficiency and deep level defect incorporation on threading dislocation density for InGaN/GaN light emitting diodes , 2012 .

[7]  Steven A. Ringel,et al.  Capture Kinetics of Electron Traps in MBE‐Grown n‐GaN , 2001 .

[8]  Daniel K. Johnstonea,et al.  Deep Centers and Their Capture Barriers in MOCVD-Grown GaN , 2001 .

[9]  Michael R. Krames,et al.  Auger recombination in InGaN measured by photoluminescence , 2007 .

[10]  Pavel Hubík,et al.  Deep defects in GaN/AlGaN/SiC heterostructures , 2009 .

[11]  Steven A. Ringel,et al.  Comparison of deep level incorporation in ammonia and rf‐plasma assisted molecular beam epitaxy n‐GaN films , 2008 .

[12]  Yutaka Ohno,et al.  Deep levels in n-type AlGaN grown by hydride vapor-phase epitaxy on sapphire characterized by deep-level transient spectroscopy , 2005 .

[13]  Martin Kuball,et al.  Iron-induced deep-level acceptor center in GaN/AlGaN high electron mobility transistors: Energy level and cross section , 2013, Applied Physics Letters.

[14]  G. Meneghesso,et al.  Degradation of InGaN-Based Laser Diodes Related to Nonradiative Recombination , 2009, IEEE Electron Device Letters.

[15]  Patrick Rode,et al.  Influence of indium content and temperature on Auger-like recombination in InGaN quantum wells grown on (111) silicon substrates , 2012 .

[16]  K. Maezawa,et al.  Drain current DLTS of AlGaN-GaN MIS-HEMTs , 2004, IEEE Electron Device Letters.

[17]  Theeradetch Detchprohm,et al.  Analysis of deep levels in n‐type GaN by transient capacitance methods , 1994 .

[18]  J. Piprek Efficiency droop in nitride‐based light‐emitting diodes , 2010 .

[19]  Steven A. Ringel,et al.  Hydrogen passivation of deep levels in n–GaN , 2000 .

[20]  D. Chi,et al.  Identification of deep levels in GaN associated with dislocations , 2004 .

[21]  M. Meneghini,et al.  A Review on the Physical Mechanisms That Limit the Reliability of GaN-Based LEDs , 2010, IEEE Transactions on Electron Devices.

[22]  D. Lang Deep‐level transient spectroscopy: A new method to characterize traps in semiconductors , 1974 .

[23]  Theeradetch Detchprohm,et al.  Deep levels in the upper band-gap region of lightly Mg-doped GaN , 1996 .

[24]  Edward T. Yu,et al.  Deep level defects in n-type GaN grown by molecular beam epitaxy , 1998 .

[25]  Ferdinand Scholz,et al.  Deep-level defects and n-type-carrier concentration in nitrogen implanted GaN , 1996 .