Non-Micropipe Dislocations in 4H-SiC Devices: Electrical Properties and Device Technology Implications

It is well-known that SiC wafer quality deficiencies are delaying the realization of outstandingly superior 4H-SiC power electronics. While efforts to date have centered on eradicating micropipes (i.e., hollow core super-screw dislocations with Burgers vectors greater than or equal to 2c), 4H-SiC wafers and epilayers also contain elementary screw dislocations (i.e., Burgers vector = 1c with no hollow core) in densities on the order of thousands per sq cm, nearly 100-fold micropipe densities. While not nearly as detrimental to SiC device performance as micropipes, it has recently been demonstrated that elementary screw dislocations somewhat degrade the reverse leakage and breakdown properties of 4H-SiC p(+)n diodes. Diodes containing elementary screw dislocations exhibited a 5% to 35% reduction in breakdown voltage, higher pre-breakdown reverse leakage current, softer reverse breakdown I-V knee, and microplasmic breakdown current filaments that were non-catastrophic as measured under high series resistance biasing. This paper details continuing experimental and theoretical investigations into the electrical properties of 4H-SiC elementary screw dislocations. The nonuniform breakdown behavior of 4H-SiC p'n junctions containing elementary screw dislocations exhibits interesting physical parallels with nonuniform breakdown phenomena previously observed in other semiconductor materials. Based upon experimentally observed dislocation-assisted breakdown, a re-assessment of well-known physical models relating power device reliability to junction breakdown has been undertaken for 4H-SiC. The potential impact of these elementary screw dislocation defects on the performance and reliability of various 4H-SiC device technologies being developed for high-power applications will be discussed.

[1]  G. Pensl,et al.  Silicon carbide, III-nitrides and related materials, ICSCIII-N'97 : proceedings of the International Conference on Silicon Carbide, III-Nitrides and Related Materials, Stockholm, Sweden, September 1997 , 1998 .

[2]  D. Wunsch,et al.  Determination of Threshold Failure Levels of Semiconductor Diodes and Transistors Due to Pulse Voltages , 1968 .

[3]  G. A. Slack,et al.  Thermal Conductivity of Pure and Impure Silicon, Silicon Carbide, and Diamond , 1964 .

[4]  Michael Dudley,et al.  White-beam synchrotron topographic studies of defects in 6H-SiC single crystals , 1995 .

[5]  Philip G. Neudeck,et al.  High‐field fast‐risetime pulse failures in 4H‐ and 6H‐SiC pn junction diodes , 1996 .

[6]  S. M. Sze,et al.  Physics of semiconductor devices , 1969 .

[7]  Philip G. Neudeck,et al.  Progress in silicon carbide semiconductor electronics technology , 1995 .

[8]  C. Kittel Introduction to solid state physics , 1954 .

[9]  Bechstedt,et al.  Influence of polytypism on thermal properties of silicon carbide. , 1996, Physical review. B, Condensed matter.

[10]  Tangali S. Sudarshan,et al.  The influence of the semiconductor and dielectric properties on surface flashover in silicon-dielectric systems , 1994 .

[11]  Michael Dudley,et al.  Hollow-core screw dislocations in 6H-SiC single crystals: A test of Frank’s theory , 1997 .

[12]  Philip G. Neudeck,et al.  2000 V 6H-SIC P-N JUNCTION DIODES GROWN BY CHEMICAL VAPOR DEPOSITION , 1994 .

[13]  Jack E. Bridges,et al.  EMP Radiation and Protective Techniques , 1976 .

[14]  P. Neudeck,et al.  Performance limiting micropipe defects in silicon carbide wafers , 1994, IEEE Electron Device Letters.

[15]  D. Stephani,et al.  Silicon Carbide and Related Materials: ECSCRM2000 , 2000 .