论文信息 - Large flexible nanowire grid visible polarizer made by nanoimprint lithography

Large flexible nanowire grid visible polarizer made by nanoimprint lithography

117 and 150nm pitch polymer gratings were successfully fabricated on plastic substrate over large area by nanoimprint lithography. Nanowire-grid polarizers were made by depositing Al on the sidewalls of the gratings at oblique angles. The effects of grating period, grating linewidth, Al depth, and thickness were studied in detail. Excellent contrast (∼1000:1) and high transmittance (80%–90%) (without antireflection coating) at the wavelength of 500nm and above were demonstrated.

[1] George R. Bird,et al. The Wire Grid as a Near-Infrared Polarizer , 1960 .

[2] Feng Liu,et al. Defect control in nanoimprint lithography , 2005 .

[3] Stephen Y. Chou,et al. Imprint of sub-25 nm vias and trenches in polymers , 1995 .

[4] L. Jay Guo,et al. Recent progress in nanoimprint technology and its applications , 2004 .

[5] S. H. Kim,et al. Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography , 2005 .

[6] 広久保田,et al. Principle of Optics , 1960 .

[7] H. Urbach,et al. Wire-grid diffraction gratings used as polarizing beam splitter for visible light and applied in liquid crystal on silicon. , 2005, Optics express.

[8] Stephen Y. Chou,et al. Direct three-dimensional patterning using nanoimprint lithography , 2001 .

[9] Mark L. Schattenburg,et al. Large‐area achromatic interferometric lithography for 100 nm period gratings and grids , 1996 .

[10] W. Hinsberg,et al. Liquid immersion deep-ultraviolet interferometric lithography , 1999 .

[11] Lei Chen,et al. Wafer-based nanostructure manufacturing for integrated nanooptic devices , 2005, Journal of Lightwave Technology.