Suppressing latchup in insulated gate transistors

Two-dimensional computer modeling of insulated gate transistor (IGT) structures has been used to demonstrate the suppression of latchup in the parasitic thyristor by increasing the p-base conductivity using a deep p+ diffusion in the device cells. Experimental verification of these modeling results has been performed with thyristor latching current density of over 1000 A per cm2achieved in 600-V devices at room temperature.

[1]  A. Goodman,et al.  The COMFET—A new high conductance MOS-gated device , 1983, IEEE Electron Device Letters.

[2]  M.S. Adler,et al.  The insulated gate rectifier (IGR): A new power switching device , 1982, 1982 International Electron Devices Meeting.