论文信息 - Elemental composition and microstructure of reactively sputtered carbon nitride thin films

Elemental composition and microstructure of reactively sputtered carbon nitride thin films

Thin films of carbon nitride have been grown on various substrates using low power radio frequency reactive sputtering of graphite in pure nitrogen plasma. A quantitative composition analysis using Rutherford backscattering spectrometry shows that the film contains about 51 at. % C, 44 at. % N, and 5 at. % O. The study of the microstructure of the films using cross‐sectional scanning electron microscopy reveals highly oriented columnar structures.

Sunil Kumar | T. Tansley

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