Optimisation of photopolymers for holographic applications using the Non-local Photo-polymerization Driven Diffusion model.

An understanding of the photochemical and photo-physical processes, which occur during photopolymerization is of extreme importance when attempting to improve a photopolymer material's performance for a given application. Recent work carried out on the modelling of the mechanisms which occur in photopolymers during- and post-exposure, has led to the development of a tool, which can be used to predict the behaviour of these materials under a wide range of conditions. In this paper, we explore this Non-local Photo-polymerisation Driven Diffusion model, illustrating some of the useful trends, which the model predicts and we analyse their implications on the improvement of photopolymer material performance.

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