Advances on NiPt SALICIDE process optimization for 28nm CMOS manufacturing
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J. Butterbaugh | Yi-Wei Chen | Nien-Ting Ho | Jerander Lai | J.F. Lin | C.C. Huang | J. Wu | J. Chu
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J. Butterbaugh | Yi-Wei Chen | Nien-Ting Ho | Jerander Lai | J.F. Lin | C.C. Huang | J. Wu | J. Chu