Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows
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Vincent Wiaux | Staf Verhaegen | Kevin Lucas | Christopher Cork | Alexander Miloslavsky | Levi D. Barnes | Gerard Luk-Pat | John Hapli | John Lewellen | Gregory Rollins | S. Verhaegen | V. Wiaux | K. Lucas | J. Lewellen | L. Barnes | C. Cork | A. Miloslavsky | Gerard Luk-Pat | John Hapli | G. Rollins
[1] D. G. Pierce,et al. Electromigration: A review , 1997 .
[2] Vincent Wiaux,et al. Double pattern EDA solutions for 32nm HP and beyond , 2007, SPIE Advanced Lithography.
[3] Vincent Wiaux,et al. Double patterning design split implementation and validation for the 32nm node , 2007, SPIE Advanced Lithography.