A 0.18 /spl mu/m 90 GHz f/sub T/ SiGe HBT BiCMOS, ASIC-compatible, copper interconnect technology for RF and microwave applications
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B. Jagannathan | J. Johnson | G. Freeman | K. Stein | D. Ahlgren | K. Schonenberg | S. Subbanna | R. Groves | S.J. Jeng | D.R. Greenberg | R. Volant | F. Huang | G. Hugo
[1] P. Roper,et al. Full copper wiring in a sub-0.25 /spl mu/m CMOS ULSI technology , 1997, International Electron Devices Meeting. IEDM Technical Digest.
[2] J. Malinowski,et al. High Q inductors in a SiGe BiMOS process utilizing a thick metal process add-on module , 1999, Proceedings of the 1999 Bipolar/BiCMOS Circuits and Technology Meeting (Cat. No.99CH37024).
[3] S. Jeng,et al. A SiGe HBT BiCMOS technology for mixed signal RF applications , 1997, Proceedings of the 1997 Bipolar/BiCMOS Circuits and Technology Meeting.
[4] Branimir Pejcinovic,et al. High-frequency characterization of heterojunction bipolar transistors using numerical simulation , 1989 .
[5] G. Freeman,et al. SiGe HBT Performance Improvements from Lateral Scaling , 1999, 29th European Solid-State Device Research Conference.