Strain relaxation of pseudomorphic Si1−xGex/Si(100) heterostructures by Si+ ion implantation
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B. Holländer | R. Loo | M. Caymax | S. Mantl | T. Hackbarth | S. Lenk | D. Buca | P. Fichtner | Howard J. Herzog | M. J. Mörschbächer
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