Carrier transport in transparent oxide semiconductor with intrinsic structural randomness probed using single-crystalline InGaO3(ZnO)5 films

We have investigated carrier transport in a crystalline oxide semiconductor InGaO3(ZnO)5 using single-crystalline thin films. When carrier concentration is less than 2×1018cm−3, logarithm of electrical conductivity decreases in proportion to T−1∕4 and room-temperature Hall mobility was as low as ∼1cm2(Vs)−1. When carrier concentration was increased to 4×1018cm−3, the conduction mechanism changed to degenerate conduction and room-temperature Hall mobility was steeply increased to >10cm2(Vs)−1, showing metal–insulator transition behavior. These results are explained by percolation conduction over distribution of potential barriers formed around conduction band edge. The potential distribution is a consequence of potential modulation originating from random distribution of Ga3+ and Zn2+ ions in the crystal structure of InGaO3(ZnO)5.

[1]  H. Ohta,et al.  Growth mechanism for single-crystalline thin film of InGaO3(ZnO)5 by reactive solid-phase epitaxy , 2004 .

[2]  H. Ohta,et al.  Thin-Film Transistor Fabricated in Single-Crystalline Transparent Oxide Semiconductor , 2003, Science.

[3]  Hideo Hosono,et al.  Single‐Crystalline Films of the Homologous Series InGaO3(ZnO)m Grown by Reactive Solid‐Phase Epitaxy , 2003 .

[4]  Benjamin J. Norris,et al.  ZnO-based transparent thin-film transistors , 2003 .

[5]  J. Tarascon,et al.  Influence of tin doping on the structural and physical properties of indium-zinc oxides thin films deposited by pulsed laser deposition , 2002 .

[6]  N. Ohashi,et al.  Crystallinity of In2O3(ZnO)5 films by epitaxial growth with a self-buffer-layer , 2002 .

[7]  H. Ohta,et al.  Novel film growth technique of single crystalline In2O3(ZnO)m (m= integer) homologous compound , 2002 .

[8]  H. Ohta,et al.  Fabrication of all oxide transparent p-n homojunction using bipolar CuInO2 semiconducting oxide with delafossite structure , 2001 .

[9]  K. Kawamura,et al.  Current injection emission from a transparent p-n junction composed of p-SrCu~2O~2/n-ZnO , 2000 .

[10]  H. Hosono,et al.  Fabrication of transparent p-n heterojunction thin film diodes based entirely on oxide semiconductors , 1999 .

[11]  K. Koumoto,et al.  Electrical and Optical Properties of Radio-Frequency-Sputtered Thin Films of (ZnO)5In2O3 , 1998 .

[12]  R. M. Wolf,et al.  A ferroelectric transparent thin‐film transistor , 1996 .

[13]  Y. Hirai,et al.  Preparation and electrical properties of LaCr1−xCuxO3 , 1988 .

[14]  Alexander L. Efros,et al.  Electronic Properties of Doped Semi-conductors , 1984 .

[15]  M. Sayer,et al.  The metal-insulator transition in lanthanum strontium vanadate , 1975 .

[16]  L. Esaki,et al.  Resonant tunneling in semiconductor double barriers , 1974 .

[17]  J L Beeby,et al.  Physics of amorphous materials , 1984 .

[18]  H. Kasper Neuartige Phasen mit wurtzitähnlichen Strukturen im System ZnOIn2O3 , 1967 .

[19]  N. Mott,et al.  Electronic Processes In Non-Crystalline Materials , 1940 .