Solution growth technique for deposition of nickel oxide thin films

Abstract A chemical method has been developed for the preparation of thin films of NiO and NiOOH on glass substrates from solution containing the amine complexes of the metal ions. The film thickness was measured gravimetrically and ranges between 0.06 μm and 0.12 μm. Some optical and electrical measurements have been carried out on these films. The optical absorption spectra show that NiO and NiOOH have band gaps of 3.25 eV and 3.75 eV respectively. The spectral variation of the optical constants has also been measured. NiO films are insulating; NiOOH has an electrical conductivity of 0.125 Ω −1 m −1 .

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