Materials characterization of WNxCy, WNx and WCx films for advanced barriers
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H. Bender | A. Franquet | Y. Travaly | D. Vanhaeren | T. Conard | Z. Tokei | A. Jonas | A. Moussa | B. Brijs | G. Vereecke | L. Carbonell | Wei-min Li | C. Drijbooms | Chao Zhao | S. Garaud | H. Volders | H. Sprey | F. Sinapi | I. Hoflijk | R. Caluwaerts