论文信息 - 48nm Pitch cu dual-damascene interconnects using self aligned double patterning scheme - 字舞流文

48nm Pitch cu dual-damascene interconnects using self aligned double patterning scheme

J. Kelly | C. Koay | Yunpeng Yin | Shyng-Tsong Chen | T. Spooner | M. Colburn | Y. Mignot | M. He | N. Lafferty | H. Shobha | O. van der Straten | S. Nam | Yongan Xu | N. Saulnier | Tae-Soo Kim | Wenhui Wang | B. Duclaux | M. Beard