Imaging layers for 50 kV electron beam lithography: Selective displacement of noncovalently bound amine ligands from a siloxane host film
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Mu-San Chen | K. W. Rhee | Walter J. Dressick | Loretta M. Shirey | F. K. Perkins | Susan L. Brandow | K. Rhee | F. Perkins | W. Dressick | L. Shirey | S. Brandow | Mu‐San Chen
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