Stability in Fluorine-Treated Al-Rich High Electron Mobility Transistors with 85% Al-Barrier Composition
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Albert G. Baca | B. A. Klein | A. M. Armstrong | A. A. Allerman | E. A. Douglas | T. R. Fortune | R. J. Kaplar | A. Allerman | A. Baca | T. Fortune | R. Kaplar | A. Armstrong | E. Douglas | B. Klein
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