Low-noise impact-ionization-engineered avalanche photodiodes grown on InP substrates

We report low noise multiplication region structures designed for avalanche photodiodes grown on InP substrates. By either implementing a single heterostructure or using a pseudograded structure in the multiplication region, better control of spatial distribution of impact-ionization for both injected and feedback carriers can be achieved; localization of the carrier impact ionization process has resulted in very low excess noise.

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