Preparation of Freestanding GaN Wafers by Hydride Vapor Phase Epitaxy with Void-Assisted Separation
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T. Ichihashi | Y. Oshima | T. Eri | M. Shibata | H. Sunakawa | Kenji K. Kobayashi | A. Usui | Takeshi Eri
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T. Ichihashi | Y. Oshima | T. Eri | M. Shibata | H. Sunakawa | Kenji K. Kobayashi | A. Usui | Takeshi Eri