Is the resist sidewall after development isotropic or anisotropic? effects of resist sidewall morphology on LER reduction and transfer during etching
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Evangelos Gogolides | Vassilios Constantoudis | Erwine Pargon | George Kokkoris | Mickael Martin | E. Gogolides | V. Constantoudis | Mickael Martin | E. Pargon | G. Kokkoris
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