Application of the Tauc-Lorentz formulation to the interband absorption of optical coating materials.

Recent progress in ellipsometry instrumentation permits precise measurement and characterization of optical coating materials in the deep-UV wavelength range. Dielectric coating materials exhibit their first electronic interband transition in this spectral range. The Tauc-Lorentz model is a powerful tool with which to parameterize interband absorption above the band edge. The application of this model for the parameterization of the optical absorption of TiO2, Ta2O5, HfO2, Al2O3, and LaF3 thin-film materials is described.

[1]  F. Urbach The Long-Wavelength Edge of Photographic Sensitivity and of the Electronic Absorption of Solids , 1953 .

[2]  Ian W. Boyd,et al.  Ultrathin high-quality tantalum pentoxide films grown by photoinduced chemical vapor deposition , 2000 .

[3]  J A Dobrowolski,et al.  Determination of optical constants of thin film coating materials based on inverse synthesis. , 1982, Applied optics.

[4]  Bloomer,et al.  Optical dispersion relations for amorphous semiconductors and amorphous dielectrics. , 1986, Physical review. B, Condensed matter.

[5]  H. Takikawa,et al.  Properties of titanium oxide film prepared by reactive cathodic vacuum arc deposition , 1999 .

[6]  C. Richter,et al.  Effects of high-temperature annealing on the dielectric function of Ta2O5 films observed by spectroscopic ellipsometry , 2000 .

[7]  H. Takikawa,et al.  Structural and optical properties of titanium oxide thin films deposited by filtered arc deposition , 1999 .

[8]  P. Hones,et al.  Optical dispersion analysis of TiO2 thin films based on variable-angle spectroscopic ellipsometry measurements , 1999 .

[9]  G. Jellison,et al.  Parameterization of the optical functions of amorphous materials in the interband region , 1996 .

[10]  T. Koslowski,et al.  Electronic Structure of Molten Salts: A Numerical Approach , 1996 .

[11]  K. Postava,et al.  Spectroellipsometric characterization of materials for multilayer coatings , 2001 .

[12]  S. Honda,et al.  Surface, structural and optical properties of sol-gel derived HfO2 films , 2000 .

[13]  S. Thakur,et al.  Spectroscopic ellipsometry of TiO2 layers prepared by ion-assisted electron-beam evaporation , 2000 .

[14]  S. Y. Kim Simultaneous determination of refractive index, extinction coefficient, and void distribution of titanium dioxide thin film by optical methods. , 1996, Applied optics.

[15]  Jon Opsal,et al.  Analytic representations of the dielectric functions of materials for device and structural modeling , 1998 .

[16]  Vladimir I. Merkulov,et al.  Characterization of thin-film amorphous semiconductors using spectroscopic ellipsometry , 2000 .

[17]  F. Tepehan,et al.  Optical properties of Ta2O5 thin films deposited using the spin coating process , 1997 .

[18]  R. Grigorovici,et al.  Optical Properties and Electronic Structure of Amorphous Germanium , 1966, 1966.

[19]  Ajeet Rohatgi,et al.  Spectroscopic ellipsometry characterization of thin-film silicon nitride , 1997 .