Grating lenses for the semiconductor laser wavelength.

Off-axis grating lenses and astigmatic grating lenses, designed for semiconductor laser wavelengths, have been fabricated by an electron-beam (EB) exposure system. High N.A. off-axis grating lenses with near-diffraction-limited operation were obtained. Grating lenses with a complex function, such as astigmatic lenses, are also available by EB lithography.