Constant-Phase-Element Behavior Caused by Resistivity Distributions in Films II. Applications

II. Applications Bryan Hirschorn,* Mark E. Orazem,** Bernard Tribollet,** Vincent Vivier,*** Isabelle Frateur, and Marco Musiani*** Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611, USA Laboratoire Interfaces et Systemes Electrochimiques, UPR 15 du CNRS, Université Pierre et Marie Curie, 75252 Paris cedex 05, France Laboratoire de Physico-Chimie des Surfaces, UMR CNRS-ENSCP 7045, Ecole Nationale Supérieure de Chimie de Paris, Chimie ParisTech, 75005 Paris, France Istituto per l’Energetica e le Interfasi, Consiglio Nazionale delle Ricerche, 35127 Padova, Italy