A Self-Aligned Two-Step Reactive Ion Etching Process for Nanopatterning Magnetic Tunnel Junctions on 300 mm Wafers
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Mahendra Pakala | Mihaela Balseanu | Jaesoo Ahn | Sajjad Hassan | M. Balseanu | C. Ching | L. Xue | S. Hassan | M. Pakala | Jaesoo Ahn | Jonathan Germain | Jonathan Germain | Lin Xue | Chi Ching | Hao Chen | Lavinia Nistor | Cong Trinh | Hao Chen | L. Nistor | Cong Trinh
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