论文信息 - High-density plasma etching of indium–zinc oxide films in Ar/Cl2 and Ar/CH4/H2 chemistries - 字舞流文

High-density plasma etching of indium–zinc oxide films in Ar/Cl2 and Ar/CH4/H2 chemistries

S. Pearton | W. Lim | Joon-Hyung Lee | Jeong-Joo Kim | Y. Heo | L. Stafford | Ju-Il Song | Jae-Soung Park | Y. Heo