论文信息 - Controlled strong excitation of silicon as a step towards processing materials at sub-nanometer precision - 字舞流文

Controlled strong excitation of silicon as a step towards processing materials at sub-nanometer precision

Y. Inubushi | M. Washio | K. Sakaue | M. Nishikino | N. Hasegawa | B. Ziaja | N. Medvedev | T. Hatano | T. Shibuya | M. Ishino | T. Higashiguchi | A. Kon | S. Owada | T. Dinh | T. Otobe | Y. Kubota | T. Kitamura