Report on 4H-SiC JTE Schottky diodes
暂无分享,去创建一个
L. Chen | D. Doneddu | P. A. Mawby | T. Bouchet | O. J. Guy | S. G. J. Batcup | S. P. Wilks | F. Torregrosa
[1] Q. Wahab,et al. Ionization rates and critical fields in 4H silicon carbide , 1997 .
[2] Andrew J. Steckl,et al. High-voltage Ni- and Pt-SiC Schottky diodes utilizing metal field plate termination , 1999 .
[3] D. Alok,et al. A simple edge termination for silicon carbide devices with nearly ideal breakdown voltage , 1994, IEEE Electron Device Letters.
[4] Krishna Shenai,et al. Optimum semiconductors for high-power electronics , 1989 .
[5] M. Melloch,et al. Design considerations and experimental analysis of high-voltage SiC Schottky barrier rectifiers , 1998 .
[6] Philip G. Neudeck,et al. 2000 V 6H-SIC P-N JUNCTION DIODES GROWN BY CHEMICAL VAPOR DEPOSITION , 1994 .
[7] M. Zafrani,et al. Static and dynamic characterization of large-area high-current-density SiC Schottky diodes , 1998, 56th Annual Device Research Conference Digest (Cat. No.98TH8373).
[8] Y. Seki,et al. The guard-ring termination for the high-voltage SiC Schottky barrier diodes , 1995, IEEE Electron Device Letters.
[9] R. Johnson,et al. Status of silicon carbide (SiC) as a wide-bandgap semiconductor for high-temperature applications: A review , 1996 .