Automated On-Wafer Noise and Load Pull Characterization Using Precision Computer Controlled Electromechanical Tuners

A wafer probing system capable of both noise, and load and source pull measurements is described. The system is based on precision computer controlled electromechanical tuners. Sophisticated system software controls calibration, measurements, data analysis and display. Results of measurements of submicron In-GaAs/InAlAs/InP HEMTs and GaAs MESFETs are presented.