Understanding the behavior of laser-produced tin plasma by time-resolved spectroscopy and simulations of their spectra
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T. McCormack | I. Kambali | E. Scally | J. White | F. O'Reilly | P. Sheridan | G. D. O'Sullivan | T. McCormack | F. O’Reilly | P. Sheridan | J. White | I. Kambali | E. Scally | G. O’Sullivan
[1] Kunioki Mima,et al. Opacity effect on extreme ultraviolet radiation from laser-produced tin plasmas. , 2005, Physical review letters.
[2] A. Cummings,et al. Simplified modeling of 13.5 nm unresolved transition array emission of a Sn plasma and comparison with experiment , 2005 .
[3] Vivek Bakshi,et al. EUV Sources for Lithography , 2006 .
[4] Padraig Dunne,et al. Angular emission and self-absorption studies of a tin laser produced plasma extreme ultraviolet source between 10 and 18 nm , 2008 .
[5] Mark S. Tillack,et al. Spectral control of emissions from tin doped targets for extreme ultraviolet lithography , 2006 .
[6] T. McCormack,et al. Time resolved studies of laser-produced plasmas of tin , 2010, Advanced Lithography.
[7] A. Cummings,et al. 13.5 nm extreme ultraviolet emission from tin based laser produced plasma sources , 2006 .
[8] John D. Gillaspy,et al. EUV Sources for Lithography, ed. by V. Bakshi , 2006 .
[9] G. Tonon,et al. X‐ray emission in laser‐produced plasmas , 1973 .
[10] Chihiro Suzuki,et al. Analysis of EUV spectra of Sn XIX–XXII observed in low-density plasmas in the Large Helical Device , 2010 .
[11] R. D. Cowan,et al. The Theory of Atomic Structure and Spectra , 1981 .
[12] C. Wagner,et al. EUV lithography: Lithography gets extreme , 2010 .
[13] Padraig Dunne,et al. Optimizing 13.5nm laser-produced tin plasma emission as a function of laser wavelength , 2007 .
[14] Mark S. Tillack,et al. Spectroscopic characterization of laser-induced tin plasma , 2005 .
[15] A. Cummings,et al. Simplified calculation of nonlocal thermodynamic equilibrium excited state populations contributing to 13.5nm emission in a tin plasma , 2007 .