Material removal mode affected by the particle size in fluid jet polishing.
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[1] Yong Zhang,et al. Study on Removal Mechanism of Nanoparticle Colloid Jet Machining , 2008 .
[2] Effects of Slurry Particles on Silicon Dioxide CMP , 2004 .
[3] Tetsuya Hoshino,et al. Mechanism of polishing of SiO2 films by CeO2 particles , 2001 .
[4] Yong Zhang,et al. Figuring of an ultra-smooth surface in nanoparticle colloid jet machining , 2009 .
[5] Yuzo Mori,et al. First-principles simulations of removal process in EEM (Elastic Emission Machining) , 1999 .
[6] Dan Guo,et al. Nanoparticle-wall collision in a laminar cylindrical liquid jet. , 2011, Journal of colloid and interface science.
[7] Shengyi Li,et al. Optimization and application of influence function in abrasive jet polishing. , 2010, Applied optics.
[8] Yongwu Zhao,et al. An Asperity Microcontact Model Incorporating the Transition From Elastic Deformation to Fully Plastic Flow , 2000 .
[9] Jingchi Yu,et al. Surface roughness and material removal in fluid jet polishing. , 2006, Applied optics.
[10] L. Cook. Chemical processes in glass polishing , 1990 .
[11] Xinmin Shen,et al. Improvement of magnetorheological finishing surface quality by nanoparticle jet polishing , 2013 .
[12] Markus Rupp,et al. Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography , 2004, SPIE Optics + Photonics.
[13] H. Frankena,et al. Fluid jet polishing of optical surfaces. , 1998, Applied optics.
[14] F. Génin,et al. Role of light intensification by cracks in optical breakdown on surfaces. , 2001, Journal of the Optical Society of America. A, Optics, image science, and vision.
[15] Peiji Guo,et al. Computer-controlled fluid jet polishing , 2007, International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT).
[16] Michael J. Runkel,et al. NIF optical materials and fabrication technologies: an overview , 2004, SPIE LASE.
[17] Shengyi Li,et al. Ultrasmooth surface polishing based on the hydrodynamic effect. , 2013, Applied optics.
[18] Kazuaki Suzuki,et al. Nikon EUVL development progress update , 2008, SPIE Advanced Lithography.
[19] S. M. Booij. Fluid Jet Polishing , 2003 .
[20] Y. Mori,et al. Figuring with subnanometer-level accuracy by numerically controlled elastic emission machining , 2002 .
[21] Particle size and surfactant effects on chemical mechanical polishing of glass using silica-based slurry. , 2010, Applied optics.