Optical beam induced currents in MOS transistors

Abstract The effect of the optical beam induced current (OBIC effect) is discussed considering a MOS structure. Compared with the simpler case of a pn junction the MOS transistor shows a complex behaviour leading to various results on the output current. It can be shown that this depends strongly on the device parameters, the spot position and the outer circuit voltage supply. Measurement results on typical CMOS structures can be explained in terms of a simplified OBIC model. A device analysis technique resulting from these aspects is discussed which allows to observe the digital logic states of the circuit under test. It thus serves as a contactless test technique inside the IC.