Metal etcher qualification using angular scatterometry
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Prasad Dasari | Igor Jekauc | Christopher J. Raymond | Mike Littau | Jasen Moffitt | Sushil Shakya | Elizabeth Donohue
[1] Robert A. Soper,et al. Scatterometry for post-etch polysilicon gate metrology , 1999, Advanced Lithography.
[2] Neal Lafferty,et al. Gauge control for sub-170-nm DRAM product features , 2001, SPIE Advanced Lithography.
[3] Costas J. Spanos,et al. Specular spectroscopic scatterometry in DUV lithography , 1999, Advanced Lithography.
[4] Christopher J. Raymond,et al. Applications of angular scatterometry for the measurement of multiply periodic features , 2003, SPIE Advanced Lithography.
[5] Ibrahim Abdulhalim,et al. Manufacturing considerations for implementation of scatterometry for process monitoring , 2000, Advanced Lithography.
[6] S. Sohail H. Naqvi,et al. Ellipsometric scatterometry for sub-0.1-μm CD measurements , 1998, Advanced Lithography.
[7] Christopher J. Raymond,et al. Novel implementations of scatterometry for lithography process control , 2002, SPIE Advanced Lithography.
[8] Christopher J. Raymond,et al. Scatterometry for the measurement of metal features , 2000, Advanced Lithography.
[9] Steve Farrer,et al. Scatterometry measurements for process monitoring of polysilicon gate etch , 1997, Advanced Lithography.
[10] Simon Ward,et al. Comparison of solutions to the scatterometry inverse problem , 2004, SPIE Advanced Lithography.
[11] Ziad Hatab,et al. Sixteen-megabit dynamic random access memory trench depth characterization using two-dimensional diffraction analysis , 1995 .
[12] John R. McNeil,et al. Metrology of subwavelength photoresist gratings using optical scatterometry , 1995 .
[13] Gary Zhang,et al. Scatterometer-based scanner fingerprinting technique(ScatterLith) and its applications in image field and ACLV analysis , 2003, SPIE Advanced Lithography.