Design and characterization of a micromachined Fabry–Perot vibration sensor for high-temperature applications

We have designed and characterized a MEMS-based Fabry–Perot device (MFPD) to measure vibration at high temperatures. The MFPD consists of a micromachined cavity formed between a substrate and a top thin film structure in the form of a cantilever beam. When affixed to a vibrating surface, the amplitude and frequency of vibration are determined by illuminating the MFPD top mirror with a monochromatic light source and analyzing the back-reflected light to determine the deflection of the beam with respect to the substrate. Given the device geometry, a mechanical transfer function is calculated to permit the substrate motion to be determined from the relative motion of the beam with respect to the substrate. Because the thin film cantilever beam and the substrate are approximately parallel, this two-mirror cavity arrangement does not require alignment or sophisticated stabilization techniques. The uncooled high-temperature operational capability of the MFPD provides a viable low-cost alternative to sensors that require environmentally controlled packages to operate at high temperature. The small size of the MFPD (85–175 µm) and the choice of materials in which it can be manufactured (silicon nitride and silicon carbide) make it ideal for high-temperature applications. Relative displacements in the sub-nanometer range have been measured and close agreement was found between the measured sensor frequency response and the theoretical predictions based on analytical models.

[1]  M. Mehregany,et al.  Polycrystalline silicon-carbide surface-micromachined vertical resonators-part II: electrical testing and material property extraction , 2005, Journal of Microelectromechanical Systems.

[2]  Richard L. Waters,et al.  Micromachined Fabry–Perot interferometer for motion detection , 2002 .

[3]  Hiroshi Hosaka,et al.  Theoretical and Experimental Study on Airflow Damping of Vibrating Microcantilevers , 1999 .

[4]  Patricia M. Nieva,et al.  Air viscous damping effects in vibrating microbeams , 2006, SPIE Smart Structures and Materials + Nondestructive Evaluation and Health Monitoring.

[5]  N. F. de Rooij,et al.  Resonant silicon structures , 1989 .

[6]  Leonard Meirovitch,et al.  Elements Of Vibration Analysis , 1986 .

[7]  Yuelin Wang,et al.  A high-performance micromachined piezoresistive accelerometer with axially stressed tiny beams , 2005 .

[8]  Wilfried Mokwa,et al.  Capacitive pressure sensor with monolithically integrated CMOS readout circuit for high temperature applications , 2002 .

[9]  Mehran Mehregany,et al.  Silicon carbide MEMS for harsh environments , 1998, Proc. IEEE.

[10]  Patricia M. Nieva,et al.  MEMS-based Fabry-Perot vibration sensor for harsh environments , 2006, SPIE Smart Structures and Materials + Nondestructive Evaluation and Health Monitoring.

[11]  E. McFarland,et al.  Multi-mode noise analysis of cantilevers for scanning probe microscopy , 1997 .

[12]  William S. Rabinovich,et al.  Microcavity interferometry for MEMS device characterization , 2003 .

[13]  P. Sarro,et al.  Fabrication of a CMOS compatible pressure sensor for harsh environments , 2004 .

[14]  H. Kahn,et al.  Wafer-level mechanical characterization of silicon nitride MEMS , 2005, Journal of Microelectromechanical Systems.

[15]  P. Sarro,et al.  Silicon carbide membrane relative humidity sensor with aluminium electrodes , 2004, 17th IEEE International Conference on Micro Electro Mechanical Systems. Maastricht MEMS 2004 Technical Digest.

[16]  M. Fonseca,et al.  Wireless micromachined ceramic pressure sensor for high-temperature applications , 2002 .

[17]  W. Fang,et al.  Determining mean and gradient residual stresses in thin films using micromachined cantilevers , 1996 .

[18]  Wolfgang R. Fahrner,et al.  Review on materials, microsensors, systems and devices for high-temperature and harsh-environment applications , 2001, IEEE Trans. Ind. Electron..

[19]  Brian D. Jensen,et al.  Interferometry of actuated microcantilevers to determine material properties and test structure nonidealities in MEMS , 2001 .

[20]  S. Sakaguchi Temperature Dependence of Transmission Characteristics of Multilayer Film Narrow Bandpass Filters , 1999 .

[21]  R. Wolffenbuttel,et al.  Optical properties of thin-film silicon-compatible materials. , 1997, Applied optics.