Factors controlling the structure of sputtered Ta films
暂无分享,去创建一个
[1] L. Feinstein,et al. Role of surface hydroxyls in the nucleation of sputtered tantalum films , 1972 .
[2] S. S. Lau,et al. Temperature Rise during Film Deposition by rf and dc Sputtering , 1972 .
[3] M. H. Read,et al. X-ray analysis of sputtered films of beta-tantalum and body-centered cubic tantalum , 1972 .
[4] L. Feinstein,et al. Structure and electrical properties of Ta films sputtered in ArO2 , 1972 .
[5] D. J. Willmott. Effect of nitrogen on the electrical and structural properties of triode‐sputtered tantalum films , 1971 .
[6] D. King,et al. Interaction of Oxygen with Polycrystalline Tungsten. II. Corrosive Oxidation , 1971 .
[7] L. Feinstein. Phases Observed in Oxygen‐Reactive Sputtering of Tantalum , 1971 .
[8] W. Westwood,et al. Effect of Substrate Bias on Tantalum Films Sputtered in an Oxygen‐Argon Mixture , 1971 .
[9] A. Schauer,et al. A very pure thin film tantalum phase , 1971 .
[10] I. Fraenz,et al. Conversion of silicon nitride into silicon dioxide through the influence of oxygen , 1971 .
[11] W. Westwood. The influence of conducting underlays on the properties of sputtered tantalum films , 1970 .
[12] P. N. Baker. R.f. sputtered tantalum films deposited in an oxygen doped atmosphere , 1970 .
[13] W. Westwood. ORIENTATION EFFECTS IN THE RESISTIVITY OF Ta FILMS SPUTTERED IN OXYGEN , 1970 .
[14] W. Westwood,et al. Phase composition and conductivity of sputtered tantalum , 1970 .
[15] R. Pinto,et al. Getter-Bias Sputtering of High Purity Metal Films in a High Current Vacuum Discharge in the 10-4 Torr Range , 1970 .
[16] E. Fisher,et al. Relation of the c′ elastic modulus to stability of b.c.c. transition metals , 1970 .
[17] R. Marcus,et al. Formation of f.c.c., b.c.c. and β-tantalum films by evaporation , 1968 .
[18] D. Campbell,et al. The mechanism of reactive sputtering , 1968 .
[19] T. Morimoto,et al. Desorbability of Chemisorbed Water on Metal Oxide Surfaces. I. Desorption Temperature of Chemisorbed Water on Hematite, Rutile and Zinc Oxide , 1968 .
[20] G. Rozgonyi,et al. Effect of Background‐Gas Impurities on the Formation of Sputtered β‐Tantalum Films , 1967 .
[21] H. Cook. An investigation of sputtered tantalum thin films , 1967 .
[22] K. Chopra,et al. FACE‐CENTERED‐CUBIC TUNGSTEN FILMS OBTAINED BY , 1966 .
[23] R. Marcus,et al. Structure of Very Thin Tantalum and Molybdenum Films , 1966 .
[24] R. J. Sneed,et al. Deposition of Tantalum, Tantalum Oxide, and Tantalum Nitride with Controlled Electrical Characteristics , 1966 .
[25] R. Marcus. Electrical and Structural Properties of Epitaxial bcc Tantalum Films , 1966 .
[26] D. Gerstenberg. Properties of Anodic Films Formed on Reactively Sputtered Tantalum , 1966 .
[27] M. H. Read,et al. A NEW STRUCTURE IN TANTALUM THIN FILMS , 1965 .
[28] T. Morimoto,et al. The Heat of Immersion of Aluminum Oxide in Water , 1964 .
[29] D. Gerstenberg,et al. Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum Films , 1964 .
[30] R. W. Christy,et al. Formation of Thin Polymer Films by Electron Bombardment , 1960 .
[31] G. J. Young. Interaction of water vapor with silica surfaces , 1958 .
[32] G. Velasco,et al. Structure and Composition of Sputtered Tantalum Thin Films on Silicon Studied by Nuclear and X‐Ray Analysis , 1972 .
[33] D. Muth. Sputtering Multilayered Conductor Films , 1971 .
[34] W. Westwood,et al. Structural and Electrical Properties of Tantalum Films Sputtered in Oxygen‐Argon Mixtures , 1971 .
[35] S. Nagata,et al. Structure of Film Prepared by Low Energy Sputtering of Molybdenum , 1971 .
[36] F. Schrey,et al. Structure and properties of r.f. sputtered, superconducting tantalum films , 1970 .
[37] Masashi Nakamura,et al. Phase Forming Processes in Tantalum Films through Sputtering , 1970 .
[38] K. Chopra. Metastable Thin Film Epitaxial Structures , 1969 .
[39] J. Hoare,et al. The electrochemistry of oxygen , 1968 .
[40] T. Hutchinson,et al. Substrate-Condensate Chemical Interaction and the Vapor Deposition of Epitaxial Niobium Films , 1967 .
[41] K. Chopra,et al. Face-centred cubic modification in sputtered films of tantalum, molybdenum, tungsten, rhenium, hafnium and zirconium , 1967 .
[42] L. Maissel,et al. Thin Films Deposited by Bias Sputtering , 1965 .