Nondestructive dose determination and depth profiling of arsenic ultrashallow junctions with total reflection X-ray fluorescence analysis compared to dynamic secondary ion mass spectrometry
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P. Pianetta | D. Giubertoni | G. Pepponi | M. Bersani | K. Luening | M. Barozzi | C. Streli | P. Wobrauschek | N. Zoeger