论文信息 - The phase slit: a new laser component

The phase slit: a new laser component

We present the promising properties of a very simple binary Diffractive Optical element which is a phase slit. The latter is made up of two plates of glass in which a phase step has been produced with ion-etching equipment. The two phase steps are set parallel and are able to slide each on the other so that the width of the phase shifting zone is continuously adjustable. The adjustable phase slit has been used for 1-D laser beam tailoring in which the key parameters that govern the shape of the far-field intensity distribution is the phase step height and the ratio of incident beam and slit widths. The phase slit is able to convert a Gaussian beam into a super-Gaussian or a hollow profile having a central depression whose depth can be continuously adjusted.

[1] R R Parsons,et al. Absorbing filter to flatten gaussian beams. , 1992, Applied optics.

[2] A. J. Morgan,et al. Random phase plates for beam smoothing on the Nova laser. , 1993, Applied optics.

[3] C. J. Kastner,et al. Beam profile shaping for laser radars that use detector arrays. , 1982, Applied optics.

[4] Ludolf Herbst,et al. High-repetition-rate excimer laser for micromachining , 2003, SPIE LASE.

[5] W. Veldkamp,et al. Laser beam profile shaping with interlaced binary diffraction gratings. , 1982, Applied optics.

[6] Joshua E. Rothenberg,et al. Comparison of beam-smoothing methods for direct-drive inertial confinement fusion , 1997 .

[7] C. M. Jefferson,et al. Design and performance of a refractive optical system that converts a Gaussian to a flattop beam. , 2000, Applied optics.

[8] M. Shinn,et al. Single-element laser beam shaper for uniform flat-top profiles. , 2003, Optics express.

[9] Carl C. Aleksoff,et al. Holographic conversion of a Gaussian beam to a near-field uniform beam , 1991 .

[10] S. R. Kumbhare,et al. A new technique for obtaining uniform intensity line focus of Gaussian laser beams , 2003 .

[11] Ulrich Rebhan,et al. 300 W XeCl excimer laser annealing and sequential lateral solidification in low temperature poly silicon technology , 2003 .