Binary solution for optimization of pixelated EUV source using constrained mathematical programming
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[1] Eytan Barouch,et al. Long-Time Instability of Pseudospectral Time-Domain Method in Curvilinear Coordinates , 2020, IEEE Transactions on Antennas and Propagation.
[2] Gijsbert Rispens,et al. Illumination source optimization in EUV lithography for staggered contact holes and pillars for DRAM applications , 2018, Advanced Lithography.
[3] Jo Finders,et al. EUV source optimization driven by fundamental diffraction considerations , 2017, Photomask Technology.
[4] P. Yu,et al. Fast source optimization involving quadratic line-contour objectives for the resist image. , 2012, Optics express.
[5] Jue-Chin Yu,et al. Impacts of cost functions on inverse lithography patterning. , 2010, Optics express.
[6] Xu Ma,et al. Generalized inverse lithography methods for phase-shifting mask design , 2007, SPIE Advanced Lithography.
[7] Alan E. Rosenbluth,et al. Global optimization of the illumination distribution to maximize integrated process window , 2006, SPIE Advanced Lithography.
[8] Y. Ye. Interior point algorithms - theory and analysis , 1998, Wiley-Interscience series in discrete mathematics and optimization.