Phonon contribution to double‐heterojunction laser operation

Laser data (77 and 300 K) are presented on two photopumped undoped metallorganic chemical vapor deposition AlxGa1−xAs ‐GaAs heterostructures with active regions consisting of: (i) a thick GaAs layer (Lz1 ∼1500 A) coupled to an auxiliary quantum‐well array of seven small Lz2 ∼50 A coupled GaAs layers, and (ii) a comparison single thick GaAs layer (Lz2 ∼600 A) in the form of a conventional double heterostructure (DH). Because of the strengthening of phonon‐assisted recombination with temperature, laser operation of the bulk (Lz ≳500 A) GaAs layers is shifted from h/ω∼Eg at 77 K to Eg −h/ωL0⩽h/ω<Eg at room temperature. This behavior of the bulk DH GaAs layers agrees with that of the reference recombination radiation observed from the auxiliary quantum‐well array (wafer ♯1), which recent work indicates is phonon assisted.

[1]  N. Holonyak,et al.  Induced phonon‐sideband laser operation of large‐quantum‐well AlxGa1−xAs‐GaAs heterostructures (Lz ∼200–500 Å) , 1980 .

[2]  Russell D. Dupuis,et al.  Quantum-well heterostructure lasers , 1980 .

[3]  C. Weisbuch,et al.  Current injection GaAs‐AlxGa1−xAs multi‐quantum‐well heterostructure lasers prepared by molecular beam epitaxy , 1979 .

[4]  N. Holonyak,et al.  Continuous room‐temperature multiple‐quantum‐well AlxGa1−xAs‐GaAs injection lasers grown by metalorganic chemical vapor deposition , 1979 .

[5]  N. Holonyak,et al.  Phonon-assisted recombination and stimulated emission in multiple quantum-well Mo-CVD AlxGa1-xAs-GaAs heterostructures (Lz∽50Å, E1-1' -2× h̵ωLO⪅h̵ω , 1979 .

[6]  N. Holonyak,et al.  Tunnel injection and phonon‐assisted recombination in multiple quantum‐well AlxGa1−xAs‐GaAs p‐n heterostructure lasers grown by metalorganic chemical vapor deposition , 1979 .

[7]  S. W. Kirchoefer,et al.  Phonon‐assisted recombination in a multiple‐quantum‐well LPE InP‐In1−xGaxP1−zAsz heterostructure laser , 1979 .

[8]  N. Holonyak,et al.  Phonon‐sideband MO‐CVD quantum‐well AlxGa1−xAs‐GaAs heterostructure laser , 1979 .

[9]  P. Dapkus,et al.  Preparation and properties of Ga 1-x Al x As-GaAs heterostructure lasers grown by metalorganic chemical vapor deposition , 1979 .

[10]  C. M. Wolfe,et al.  Temperature dependence of the lasing transition in high-purity GaAs , 1973 .

[11]  H. Kressel,et al.  Lasing Transitions in p+‐n‐n+ (AlGa) As–Ga As Heterojunction Lasers , 1972 .

[12]  H. M. Manasevit The Use of Metal‐Organics in the Preparation of Semiconductor Materials: III . Studies of Epitaxial III ‐ V Aluminum Compound Formation Using Trimethylaluminum , 1971 .

[13]  N. Holonyak,et al.  Laser Recombination Transition in p-TYPE GaAs , 1969 .

[14]  F. Stern,et al.  Properties of Semiconductor Surface Inversion Layers in the Electric Quantum Limit , 1967 .