Computer aided proximity correction for direct write E-beam lithography

Abstract First results of an evolutionary software project are presented. It aims at improving high resolution of many different e-beam writers and will be available on workstations. Selecting critical structure details and preserving hierarchy are key issues to cut down computer time. An “ASIC” and an optical grid were written with CAPROX. Critical dimensions are in good agreement with nominal values as opposed to uncorrected patterns.