Structural, optical and electrical properties of fluorine doped tin oxide thin films deposited using inkjet printing technique

This paper reports on structural, optical transmittance and electrical properties of fluorine-doped tin oxide (FTO) thin films deposited using an inkjet printer. The FTO ink was synthesized from a mixture of tin chloride pentahydrate (SnCl4.5H2O) and ammonium fluoride (NH4F) solutions. The thin films were deposited on glass substrates at ambient temperature or heated at 40oC and 60oC. The surface electronic state and the elemental composition of the thin films were analyzed using XPS spectroscopy. The spectra of the FTO thin films revealed that tin, oxygen, fluoride and carbon were present in the samples. The signals corresponding to Sn 3d5/2, O1s, and F1s were found at 486.6 eV, 530.5 eV and 684.5 eV, respectively. XRD analysis showed that the FTO films were in the form of crystalline with cassiterite shape. The optical and electrical properties of the films were affected by the deposition temperatures. It was observed the film deposited at 40oC has the optimum optical transmittance and sheet resistivity which were 91%T and 16 Ω/, respectively.

[1]  M. Aegerter,et al.  Comparison of spray pyrolyzed FTO, ATO and ITO coatings for flat and bent glass substrates , 1999 .

[2]  R. Auyeung,et al.  Optimization of F-doped SnO2 electrodes for organic photovoltaic devices , 2008 .

[3]  J. Gwak,et al.  Synthesis of indium tin oxide (ITO) and fluorine-doped tin oxide (FTO) nano-powder by sol–gel combustion hybrid method , 2007 .

[4]  F. Donsanti,et al.  Deposition of transparent conductive tin oxide thin films doped with fluorine by PACVD , 2003 .

[5]  Yongxiang Li,et al.  Fabrication of BaTiO3 dielectric films by direct ink-jet printing , 2004 .

[6]  Alberto Salleo,et al.  Printing Methods and Materials for Large-Area Electronic Devices , 2005, Proceedings of the IEEE.

[7]  K. Chattopadhyay,et al.  Synthesis and Characterization of Nano-Crystalline Fluorine-Doped Tin Oxide Thin Films by Sol-Gel Method , 2003 .

[8]  V. Babu,et al.  Compositional analysis and depth profile studies on undoped and doped tin oxide films prepared by spray technique , 1998 .

[9]  L. Huerta,et al.  Physicochemical characteristics of fluorine doped tin oxide films , 2006 .

[10]  V. Matolín,et al.  XPS, ISS and TPD study of Pd–Sn interactions on Pd–SnOx systems , 2001 .

[11]  Shubra Singh,et al.  SnO2:F/n-Si and In2O3:Sn/n-Si semiconductor/insulator/ semiconductor solar cells , 1985 .

[12]  K. Ramamurthi,et al.  Studies on micro-structural and electrical properties of spray-deposited fluorine-doped tin oxide thin films from low-cost precursor , 2005 .

[13]  Guozhong Cao,et al.  Fabrication and characterization of fluorine-doped thin oxide thin films and nanorod arrays via spray pyrolysis , 2007 .

[14]  B. Thangaraju Structural and electrical studies on highly conducting spray deposited fluorine and antimony doped SnO2 thin films from SnCl2 precursor , 2002 .

[15]  F. Caballero-Briones,et al.  Chemical and phase composition of SnOx:F films grown by DC reactive sputtering , 2001 .

[16]  C. H. Bhosale,et al.  Effect of solvent ratio on the properties of highly oriented sprayed fluorine-doped tin oxide thin films , 2007 .

[17]  G. Muralidharan,et al.  Preparation and characterization of F doped SnO2 films and electrochromic properties of FTO/NiO films , 2009 .

[18]  Hajime Haneda,et al.  Fluorine-doped TiO2 powders prepared by spray pyrolysis and their improved photocatalytic activity for decomposition of gas-phase acetaldehyde , 2005 .