Laser crystallized multicrystalline silicon thin films on glass
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J. Bergmann | Gudrun Andrä | Fritz Falk | F. Falk | G. Andrä | J. Bergmann
[1] Ralf B. Bergmann,et al. The future of crystalline silicon films on foreign substrates , 2002 .
[2] Junichi Sato,et al. Formation of (100)-Textured Si Film Using an Excimer Laser on a Glass Substrate , 2003 .
[3] F. Falk,et al. Defect population and electrical properties of Ar + -laser crystallized polycrystalline silicon thin films , 2000 .
[4] Tayeb Mohammed-Brahim,et al. Thin film transistors on large single crystalline regions of silicon induced by cw laser crystallization , 2004 .
[5] F. Falk,et al. Preparation of single crystalline regions in amorphous silicon layers on glass by Ar+ laser irradiation , 2000 .
[6] S. Kawamura,et al. Recrystallization of Si on amorphous substrates by doughnut‐shaped cw Ar laser beam , 1982 .
[7] G. Fortunato,et al. Excimer laser crystallization techniques for polysilicon TFTs , 2000 .
[8] S. Borneis,et al. TFT Annealing with Excimer Laser. Technology and Market Outlook , 1998 .